Substantially improved matching for 2D patterns

نویسنده

  • Ronald Goossens
چکیده

Semiconductor manufacturing continues to charge down Moore’s Law of scaling. But every shrink increases the burden on lithography imaging. Traditional paths include increasing NA and reducing the illumination wavelength. However, the latest systems have maxed out NA for water-based immersion and wavelength developments are awaiting EUV systems, which are a few years away from volume production capability.

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تاریخ انتشار 2010